Highlights
Material Safety Data Sheets
IC fabrication utilizes many aggressive chemicals. It is the responsibility of the workers in the lab to have an understanding of what these chemicals can do and how to safely handle them.
Chemicals Used in MNTL Cleanrooms (partial list) - links will open the chemical's MSDS in a new browser window
- Acetone - (CH3)2CO
- Ammonium Fluoride - NH4F
- Ammonium Hydroxide - NH4OH
- Buffered Oxide Etch - NH4-HF Aqueous Solution
- Chromium Etchant - CEP-200
- Hexamethyldisilazane - HMDS - ((CH3)3Si)2NH
- Hydrofluoric Acid - HF
- Hydrogen Peroxide - H2O2
- Hydrochloric Acid - HCl
- Isopropyl Alcohol (IPA) - (CH3)2 CHOH
- Methanol - CH3OH
- Methylene Chloride - CH2Cl2
- Phosphoric Acid - H3PO4
- Nitric Acid - HNO3
- Sulfuric Acid - H2SO4
- Shipley 1813 photoresist
- Shipley MF-319 Developer
- Xylene - C6H4(CH3)2