Facilities
Highlights
Anvik Large-Area Lithography System (HEXSCAN 2020 SXE)
System Description:
The Anvik HEXSCAN 2020 SXE is a large-area, high-resolution projection lithography system equipped with a KrF excimer laser at 248nm wavelength and 80W average power. It can be used for both photolithography and photoablation applications. The 1:1 projection imaging system has resolution down to 2micron. Using the seamless overlapping scanning design, exposure can be done over large areas (up to 50x50cm) with layer-to-layer alignment accuracy of 2.5micron. Currently only 6" mask can be used in the system.
For more information contact Marty Harris (mdharris@uiuc.edu) or Edmond Chow (echow@uiuc.edu)
Last Updated: Sep 2007