Facilities
Highlights
CHA SEC-600 E-Beam/Thermal Evaporator
Description:
The CHA system is reserved for thin film evaporations, 5000Å or less per deposition. The tool operates at a base pressure of 5 x 10 – 7 T and has 2 independent resistive power supplies and an electron beam (e – beam) gun with 4 automatically selected source crucibles. Currently approved deposition materials are Ag, Au, Cr, Ge, Ni, Mo, Pd, Pt, Ti, and W. Two 4 inch (100mm) round targets can be positioned (automatically) above any of the three sources. Alternatively, a 1 inch square sample holder with 1000W substrate heater can be installed above a resistive source. A computerized controller provides precise control of deposition thickness and rate, and allows one to save and reload recipes for single and multiple layer processes.