Facilities
Highlights
Jipelec Rapid Thermal Processor (RTP)
Description:
The Jipelec JetFirst RTP feature a temperature measurement and control system to provide accurate and repeatable thermal behavior from low to high temperatures
The lamp array, upper flange and quartz window are mounted in a rotating top lid allowing full access to the chamber for easy loading and unloading of the wafers and piece-parts samples
Applications:
- RTA: Annealing for silicon and III-V wafers
- RTO: Rapid Thermal Oxidation
- Contact Alloying
Features:
- Up to 150 mm wafers
- Cold wall chamber technology
- Pyrometer and thermocouple temperature control
- Atmospheric and vacuum process capability
- One purge gas line
- Up to 3 gas lines with MFC
- PC control
- Vacuum valve and vacuum gauge
Performance:
- Temperature range: ambient to 1300°C
- Ramp rate: 1°C/s to 30°C/s