Facilities
Highlights
PlasmaLab Dual-Chamber Reactive Ion Etcher
Description:
The “master” chamber is a turbo pumped
general purpose RIE utilizing the following gases:
HBr, Ar, O2, SiCl4, R12 (CCl2F2), SiF4, H2, CH4, and He.
The “slave” chamber is also general purpose and uses:
R14 (CF4), SF6, CH4, Ar, O2, and SiF4.